When polishing by the polisher, the grinding surface of the sample and the polishing disc should be absolutely parallel and lightly pressed on the polishing disc evenly. Pay attention to prevent the sample from flying out and new grinding marks due to too much pressure. At the same time, the sample should be rotated and moved back and forth along the radius of the turntable to avoid local wear of the polishing fabric too fast. During the polishing process, the micro-powder suspension should be continuously added to keep the polishing fabric in a certain humidity. Too much humidity will weaken the scratch effect of polishing. In order to achieve the purpose of rough throwing, the rotating speed of the turntable is required to be low, preferably not more than 500r/min. The polishing time should be longer than the time required to remove the scratches because the deformation layer is also removed. After rough polishing, the surface is smooth, but dull and needs to be improved by fine polishing. The rotation speed can be appropriately increased during fine polishing, and the polished surface is as bright as a mirror after fine polishing.
